Ion implantation-induced nanoparticle formation

Ion implantation-induced nanoparticle formation refers to the process of creating nanoparticles within a material by implanting ions at high energies. This technique is often utilized in materials science and semiconductor fabrication to modify the properties of solids at a nanoscale level. ### Key Aspects of Ion Implantation-Induced Nanoparticle Formation: 1. **Ion Implantation Process**: - Involves shooting ions (charged particles) into a target material, which can be a semiconductor, metal, or insulator.