Thermal oxidation

Thermal oxidation is a process used in semiconductor manufacturing and materials science to create a layer of oxide on the surface of a material, typically silicon. This process involves exposing silicon wafers to an oxidizing environment at high temperatures, resulting in the formation of silicon dioxide (SiO2) films. ### Key Points about Thermal Oxidation: 1. **Purpose**: The primary purpose of thermal oxidation is to create a dielectric layer that serves as an insulator.