Ion beam-assisted deposition

Ion beam-assisted deposition (IBAD) is a materials deposition technique that combines traditional physical vapor deposition (PVD) methods with an energetic ion beam to enhance the properties of thin films. In this process, a deposition material—typically a metal, semiconductor, or dielectric—is evaporated or sputtered onto a substrate, while simultaneously directing a beam of ions (which can be inert gases like argon) at the growing film surface.